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    Product laser

    Products
    Wafer Level TGV Laser Micro-Drilling System
    Product Introduction
    This system utilizes a precise motion control platform combined with advanced laser modification technology to perform high-density micro-hole and micro-trench processing on various glass substrates. This is a crucial manufacturing step before metallization processes for semiconductors and display packaging applications.
    Product Features

    Excellent material compatibility supports quartz, borosilicate, soda-lime, aluminosilicate, and other specialty glass types

    Flexible patterning capabilities enable fabrication of round holes, square holes, blind vias, through vias, and micro-grooves as required

    Outstanding deep-hole processing with aspect ratio up to 1:100, minimum hole diameter ≤ 5 μm

    Good hole quality with smooth inner-side walls that are free of cracks and burs

    High throughput and capacity optimized for large-scale production

    Precise positioning and repeatability for micro-level accuracy


    Field of application
    Glass-based chip packaging, display chip encapsulation, etc.
    Technical indicators
    Specification
    Details
    Substrate Size
    4 to 12-inch round or square wafers
    Loading Method
    Automated cassette feed (basket-type) for 4 to 12-inch wafers
    Processing Type
    Fixed-beam laser + high-precision motion platform
    Platform Speed
    ≤ 1000 mm/s
    Hole Shapes
    Circular, square, blind via, through via, micro-trench
    Minimum Hole Diameter
    5 μm
    Maximum Aspect Ratio
    1:100
    Platform Accuracy
    Repeatability ≤ ±1 μm; Positioning accuracy < ±2 μm
    Pattern Placement Accuracy
    ≤ ±3 μm within a 300 mm processing range
    Throughput
    ≥ 5000 points per second

    Application Cases